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Intel: contract with ASML for EUV lithography system

( - In a long-standing collaboration between both partners, Intel has announced that it has issued its first purchase order to ASML for the delivery of the first TWINSCAN EXE: 5200 system, an EUV (extreme ultraviolet lithography) lithography system capable of producing more than 200 wafers (semiconductor wafers) per hour for industry.

ASML says that the system offers continuous lithographic improvements with reduced complexity, cost, cycle time and energy.

Intel wants to remain at the forefront of semiconductor lithography technology and has been building its expertise and EUV capabilities over the past year, Intel said meanwhile.

The next step is expected in 2025 with High NA technology and its 0.55 NA numerical aperture, the partners said.

However, ASML are currently down almost 4%, while Intel stocks slipped over 1.5% in New York yesterday.

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